The electron beam lithography facility is equipped with two state of the art machines capable of writing extremely high resolution patterns.  This capability can be used to produce both single levels of extreme resolution patterning and complex multi-layered devices with high accuracy pattern alignment.  The available machines are a Vistec VB6 UHR EWF, which is a state of the art high resolution wide field tool capable of handling substrates up tp 8”.  This is complemented by a Vistec EBPG5 HR100 which has patterned more than 35,000 substrates in the past 10 years.

This depth of experience at Glasgow is central to our ability to translate your needs to high resolution patterning.  The specifications for each machine are listed to the right.