High Resolution LithographyNanoimprint Lithography  
 

Man using imaging device

  • Fully automated computer controlled imprinting cycles
  • Graphical data logging
  • Max temperature 250°C
  • Max pressure 70 bar - but normally used at around 20 Bar
  • Feature sizes down to 20 nm
  • Substrate sizes up to 65 mm

 

 
Vistec VB6 UHR EWF
Vistec EBPG HR 100
Nanoimprint Lithography
 

Paper Aeroplane Image