Photolithography:
To complement our high resolution E-Beam lithography capability, we have a suite of conventional photolithography tools with the capability of both top side and back side alignment.

Etch:
A range of RIE and ICP etch tools are available, supplied with an extensive range of process gasses to allow most applications. Wet etch facilities are also available, including deep silicon etch.

Deposition:
Metal deposition is available via e-beam evaporation or sputter tools.  An extensive range of metals is available in-house.

Molecular Beam Epitaxy:
Through our links with the University of Glasgow we offer access to the MBE growth facilities owned by the University and housed at Photonix. The Molecular Beam Epitaxy (MBE) Research Group in Glasgow on Varian 3” Mod Gen II machine equipped with In, Ga, Al, As2, N-Plasma, Si and Be sources and a new dual-chamber 4” Gen III, now manufactured by Veeco Instruments Inc. This is complemented by apparatus for characterising the electrical, optical and structural properties of MBE samples includes a 4-300 K hall effect apparatus, a high resolution 10K photoluminescence.

Inspection: The state of the art inspection facilities include 2x Hitachi Scanning Electron Microscopes, an Atomic Force Microscope, surface profiler and a range of optical inspection microscopes.